The OAI Model 204 Mask Aligner features collimated UV light in near or deep UV using lamps ranging in power from 200 to 2000 watts and is capable of 1 micron resolution. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. This Mask Aligner is a flexible, economic solution for a variety of mask alignment and UV exposure applications. This model supports 4" wafers and 5" masks.
*NOTE: Users of the BNC may be required to complete onsite and/or on-demand training in order to reserve this instrument. Requirements will be shared by the lab prior to your appointment. Please reach out to us through Second Lab messages and we'll be happy to help you plan for your first booking.
